Hong Kong, China

Liancheng Yang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Asm Technology Singapore Pte Ltd. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Liancheng Yang. Retrieved from https://idiyas.com/inventor/liancheng-yang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Liancheng Yang and Lens Alignment Technology.

Introduction

Liancheng Yang is an inventor associated with Hong Kong, CN. His patent work concerns the precise alignment of multiple lens elements, a process that can help improve the image quality of a lens assembly.

Latest Patents

Yang is associated with 1 patent, titled “System and Method for Aligning Multiple Lens Elements.” The invention separates a lens assembly into first and second lens modules during alignment. It first coarsely aligns the optical axes of lens elements in the two modules. For fine alignment, an image sensor captures a test chart through the modules at different relative positions. Image-quality indices are then compared, and the modules are fixed together at the position where those indices are optimized.

Career Highlights

Yang is associated with ASM Technology Singapore Pte Ltd. His patent describes a staged alignment method that combines optical-axis positioning with image-based evaluation to determine the relative placement of lens modules.

Collaborations

Chun Ting Tang and Po Lam Au are identified as Yang’s coworkers. The supplied information does not specify their roles in the patent or the extent of their collaboration.

Conclusion

Liancheng Yang’s recorded patent focuses on improving lens assembly alignment through coarse positioning and image-quality-based fine adjustment.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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