Li-Yuen Tang

Title: Li-Yuen Tang: Innovator in Semiconductor Technology

Introduction

Li-Yuen Tang is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent in complementary metal-oxide-semiconductor (CMOS) devices. His work is essential in advancing the capabilities of electronic devices.

Latest Patents

Li-Yuen Tang holds a patent for a complementary metal-oxide-semiconductor device and the method of fabricating it. This patent describes a CMOS device that includes a substrate with a first active region and a second active region. It features a first gate structure and a second gate structure, each positioned on their respective active regions. The design also incorporates first and second spacer structures on the sidewalls of the gate structures, along with lightly doped drain (LDD) regions in the substrate. An epitaxial material layer is included in the first active region, and a passivation layer, which contains a carbon-containing oxynitride layer, covers various components of the device.

Career Highlights

Li-Yuen Tang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to contribute to cutting-edge technologies and innovations in semiconductor fabrication.

Collaborations

Throughout his career, Li-Yuen Tang has collaborated with talented individuals such as Che-Hung Liu and Po-Lun Cheng. These collaborations have fostered a creative environment that encourages innovation and the development of advanced technologies.

Conclusion

Li-Yuen Tang's contributions to semiconductor technology through his patent and work at United Microelectronics Corporation highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of electronic devices.