Li Ying Choo

Title: Innovations by Li Ying Choo

Introduction

Li Ying Choo is a notable inventor based in Singapore, recognized for his contributions to the field of materials science and engineering. He has been instrumental in developing advanced methods for film deposition, which are crucial for various applications in electronics and optics. With a total of 2 patents, his work continues to influence the industry.

Latest Patents

Li Ying Choo's latest patents include innovative methods for depositing film layers. One of his patents describes a method for depositing a film layer on a substrate that incorporates ion flux control to alter sputtering atom trajectories. This method involves flowing argon gas around the periphery of the substrate, forming a plasma to ionize the argon gas, and generating an AC bias on the substrate to enhance the ion flux density. This process significantly improves the deposition quality of aluminum atoms on the substrate.

Another significant patent focuses on methods and apparatus for depositing amorphous indium tin oxide film. This involves positioning a substrate opposite a sputter target of indium tin oxide, flowing a plasma-forming gas, and sputtering the indium tin oxide onto the substrate while applying AC bias. These advancements are essential for enhancing the performance of electronic devices.

Career Highlights

Li Ying Choo is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at the company has allowed him to collaborate with other talented professionals and contribute to groundbreaking innovations in film deposition technologies.

Collaborations

Li has worked alongside notable colleagues, including Yaoying Zhong and Siew Kit Hoi, who have also made significant contributions to their respective fields. Their collaborative efforts have further advanced the research and development of new materials and processes.

Conclusion

Li Ying Choo's innovative work in film deposition methods showcases his expertise and commitment to advancing technology in materials science. His contributions are paving the way for future developments in the industry.