This inventor holds 4 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2001-2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Zhong-he, TW (2001)
- Jhonghe, TW (2006)
- Chong-Her, TW (2015 - 2016)
Company Filing History:
Years Active: 2001-2016
Title: Li-Wei Kung: Innovator in Photolithographic Technology
Introduction
Li-Wei Kung is a prominent inventor based in Chong-Her, Taiwan. He has made significant contributions to the field of photolithography, particularly in the development of advanced mask technologies. With a total of 4 patents to his name, Kung continues to push the boundaries of innovation in semiconductor manufacturing.
Latest Patents
One of Li-Wei Kung's latest patents is focused on a multiple-patterning photolithographic mask and method. This invention involves a composite mask that is suitable for multiple-patterning lithographic processes. The exemplary embodiment includes receiving a mask with a plurality of sub-reticles and a substrate with one or more regions. A first sub-reticle is aligned with a specific region of the substrate. A designated movement pattern relative to the substrate is established. The first photolithographic process is then performed, exposing the substrate using the mask to create a first exposed area. The alignment of the mask is subsequently shifted according to a predetermined direction. A second photolithographic process follows, which also exposes the substrate to form a second exposed area that overlaps the first.
Career Highlights
Li-Wei Kung is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on enhancing photolithographic techniques that are crucial for the production of advanced microchips. His innovative approaches have garnered attention and respect within the industry.
Collaborations
Li-Wei Kung has collaborated with notable colleagues, including Yung-Cheng Chen and Chang-Jyh Hsieh. These partnerships have contributed to the advancement of technologies in the semiconductor field.
Conclusion
Li-Wei Kung's contributions to photolithographic technology exemplify the spirit of innovation in the semiconductor industry. His patents and collaborative efforts continue to shape the future of manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile