Li Wang

Title: Innovations by Li Wang: Advancements in Plasma Etching Techniques

Introduction

Li Wang, an accomplished inventor based in Hillsboro, OR, has made significant contributions to the field of semiconductor manufacturing. With a total of two patents to her name, Wang is recognized for her innovative methods that enhance the efficiency and effectiveness of plasma etching processes.

Latest Patents

Li Wang's latest inventions include two notable patents. The first patent, titled "Method of Plasma Etching of Silicon-Containing Organic Film Using Sulfur-Based Chemistry," outlines a technique for etching substrates composed of silicon-containing organic materials. This method utilizes a chemical mixture formed through the plasma-excitation of a process gas containing sulfur fluoride (SF) and an optional inert gas. The process is designed to selectively etch the silicon-containing material while preserving other components on the substrate.

The second patent concerns a "Selective SiARC Removal" process, which describes methods and systems for the removal of silicon anti-reflective coating (SiARC) layers. This invention involves providing a substrate containing multiple layers, including a resist layer, a SiARC layer, and a pattern transfer layer. The method includes a series of steps that convert the SiARC layer into a porous state, followed by an effective removal process that aligns with target integration objectives essential for semiconductor applications.

Career Highlights

Li Wang is currently employed at Tokyo Electron Limited, a leading company in semiconductor and flat panel display manufacturing. Her role involves advancing etching technologies that play a critical part in the production of integrated circuits. Wang's expertise and insights have contributed to the successful deployment of innovative methodologies in the industry.

Collaborations

Throughout her career, Li Wang has collaborated with notable colleagues such as Andrew Nolan and Shyam Sridhar. Together, they have worked on various projects aimed at developing more refined processes that push the boundaries of current semiconductor technology.

Conclusion

Li Wang's contributions to the field of semiconductor manufacturing are evident in her pioneering patents and collaborative efforts. By leveraging advanced plasma etching techniques, she continues to influence the industry's evolution, paving the way for future innovations in semiconductor technology. Her work exemplifies the remarkable impact that dedicated inventors can have on enhancing manufacturing processes and improving technological advancements.