Company Filing History:
Years Active: 2015
Title: Celebrating the Innovations of Li-Tien Huang in Semiconductor Technology
Introduction: Li-Tien Huang, an inventive mind hailing from New Taipei, Taiwan, has made significant contributions to the field of semiconductor technology. With a strong focus on enhancing device performance, Li-Tien is recognized for his innovative approach in the industry. His work primarily revolves around the optimization of gate dielectric materials, a critical component in semiconductor devices.
Latest Patents: Li-Tien Huang holds a patent for the invention titled "In-situ nitridation of gate dielectric for semiconductor devices." This patent describes a semiconductor substructure that enhances performance through the incorporation of a dielectric film over a substrate, which consists of at least one metal dielectric layer, one oxygen-donor layer, and one nitride-incorporation layer. The innovation therein plays a crucial role in advancing semiconductor technologies, offering improved efficiency and effectiveness in device functionalities.
Career Highlights: Li-Tien is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor manufacturing industry. His expertise and dedication have positioned him as a vital contributor to groundbreaking projects within the company, making strides in the development of high-performance semiconductor devices.
Collaborations: Throughout his career, Li-Tien has had the opportunity to collaborate with esteemed colleagues, including Liang-Chen Chi and Chia-Ming Tsai. These collaborations have fostered an environment of innovation and teamwork, enabling the successful development and patenting of advanced technologies in the semiconductor sector.
Conclusion: Li-Tien Huang's work exemplifies the spirit of innovation that drives the semiconductor industry forward. With his notable patent and contributions to Taiwan Semiconductor Manufacturing Company Limited, he continues to pave the way for future advancements in semiconductor technology. His collaborations and dedication to enhancing device performance hold the promise of significant progress in this vital field.