Li-Lan Wu

Title: Innovator Spotlight: Li-Lan Wu

Introduction: Li-Lan Wu is a notable inventor based in Hsin-Chu, Taiwan. With a focus on advancements in semiconductor technology, Wu has contributed significantly to the field through his innovative patent.

Latest Patents: Wu holds a patent for "Methods for Wet Clean of Oxide Layers Over Epitaxial Layers". This invention includes a comprehensive process involving the formation of an epitaxial layer of semiconductor material over a substrate, followed by the creation of an oxide layer. The process enhances the cleaning of oxide layers through the application of solutions containing an oxidizer, and additional techniques like densification processes involving thermal or UV energy. His work is particularly relevant for gate-all-around devices, improving the efficiency and effectiveness of semiconductor fabrication.

Career Highlights: Li-Lan Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leader in semiconductor manufacturing. His role has allowed him to develop cutting-edge technologies that streamline semiconductor production processes. With a single patent to his name, Wu exemplifies the innovative spirit that drives progress within his industry.

Collaborations: Throughout his career, Wu has collaborated with several accomplished professionals, including Chi-Yuan Chen and Ming-Chyi Liu. These partnerships have fostered an environment of innovation and creativity, further enhancing the work being done at TSMC.

Conclusion: Li-Lan Wu’s contributions to the semiconductor field through his patented methods demonstrate the critical role inventors play in technological advancement. His work not only improves existing processes but also paves the way for future innovations in semiconductor technology.