Taiwan Semiconductor Manufacturing Comp. Ltd.

Li-Lan Wu

Teng-Chun Tsai

Huicheng Chang

Li-Ting Wang

Cheng-Tung Lin

Ming-Chyi Liu

Kuo-Yin Lin

Chi-Yuan Chen

Wan-Chun Pan

Ming-Liang Yen

Cary Chia-Chiung Lo

Methods for an oxide layer over an epitaxial layer. In an embodiment, a method includes forming an epitaxial layer of semiconductor material over a semiconductor substrate; forming an oxide layer over the epitaxial layer; applying a solution including an oxidizer to the oxide layer; and cleaning the oxide layer with a cleaning solution. In another embodiment, a densification process is applied to an oxide layer including treating with thermal energy, UV energy, or both. In an embodiment for a gate-all-around device, the cleaning process is applied to an oxide layer over an epitaxial portion of a fin. Additional methods are disclosed.

Methods for wet clean of oxide layers over epitaxial layers

Growing community of inventors

Hsin-Chu, Taiwan

Li-Lan Wu