This inventor holds 4 USPTO granted patents. Top assignees: Hewlett-Packard Company, Actel Corporation, Inc., Other. Active years: 1992-1999.
Company Filing History:
2 out of 9,639 
1 out of 463 
1 out of 834,411 Years Active: 1992-1999
Title: **Leuh Fang: Innovator in Antifuse Technology**
Introduction
Leuh Fang, a notable inventor residing in Santa Clara, CA, has made significant contributions to the field of electronic engineering with a focus on advanced antifuse technology. With a total of four patents to his name, Fang's innovations are paving the way for enhanced performance in electronic devices.
Latest Patents
Fang's latest patents include groundbreaking methods for creating metal-to-metal antifuses. The structure of these antifuses involves several critical components: a bottom planarized electrode, an inter-layer dielectric (ILD) positioned above it, and an antifuse cell opening that exposes the bottom electrode. The design features a first barrier metal layer that protects the antifuse material from diffusion, creating a more effective bottom electrode with a reduced area, ultimately leading to a decrease in device capacitance. This inventive approach has implications for improving the efficiency and reliability of electronic components.
Career Highlights
Throughout his career, Leuh Fang has been associated with esteemed organizations, most notably Hewlett-Packard Company. His role in advancing antifuse technology has allowed him to establish himself as a leading figure in the field, contributing valuable insights and innovations that profoundly impact the industry.
Collaborations
Fang has collaborated with respected colleagues, including Shih-Oh Chen and Elaine K Poon. These partnerships have facilitated the exchange of ideas and propelled the innovation of antifuse technology, further solidifying Fang's influence in the electronic engineering landscape.
Conclusion
Leuh Fang's inventive spirit and commitment to enhancing antifuse technology underscore his position as a prominent inventor in electronic devices. With a portfolio of patents reflecting his innovative contributions, Fang continues to inspire the next generation of engineers and inventors in the field. His work not only advances technological boundaries but also emphasizes the importance of collaboration and innovation in engineering endeavors.