Company Filing History:
Years Active: 2008-2016
Title: Unveiling the Innovations of Leon Joseph Marie Van Den Schoor
Introduction:
Leon Joseph Marie Van Den Schoor, a brilliant inventor hailing from 's-Hertogenbosch, Netherlands, has made significant contributions to the field of lithographic apparatus design. With a total of four patents to his name, Van Den Schoor is known for his revolutionary advancements in immersion lithography systems.
Latest Patents:
Van Den Schoor's latest patents showcase his expertise in lithographic apparatus technology. One of his notable inventions includes a groundbreaking immersion liquid supply system with an aperture. This innovation ensures a constant flow of liquid by maintaining the liquid at a consistent height above a flow restrictor. Additionally, he has developed a lithographic apparatus integrated with a radiation collector featuring fluid ducts for thermal conditioning.
Career Highlights:
A key figure at Asml Netherlands B.V., Van Den Schoor has been instrumental in driving innovation in the semiconductor industry. His work at this prestigious company has led to the development of cutting-edge lithographic apparatus that have revolutionized the manufacturing processes of devices.
Collaborations:
Throughout his career, Van Den Schoor has collaborated closely with esteemed colleagues such as Johannes Christiaan Leonardus Franken and Alexander Matthijs Struycken. Together, they have synergized their expertise to push the boundaries of technological advancements in lithography.
Conclusion:
In conclusion, Leon Joseph Marie Van Den Schoor stands as a pioneering inventor in the realm of lithographic apparatus design. His relentless dedication to innovation and collaboration underscores his commitment to shaping the future of the semiconductor industry. Van Den Schoor's patents continue to inspire and drive progress in the ever-evolving field of immersion lithography.