The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2009
Filed:
Dec. 21, 2005
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Nicolaas Antonius Allegondus Johannes Van Asten, Breda, NL;
Wilhelmus Josephus Box, Eksel, BE;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Leon Martin Levasier, Hedel, NL;
Erik Roelof Loopstra, Heeze, NL;
Marcel Johannus Elisabeth Hubertus Muitjens, Nuth, NL;
Luberthus Ouwehand, 's-Hertogenbosch, NL;
Leon Joseph Marie Van Den Schoor, 's-Hertogenbosch, NL;
Marcel Beckers, Eindhoven, NL;
Rob Jansen, Veldhoven, NL;
Elke Van Loenhout, Asten, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Nicolaas Antonius Allegondus Johannes Van Asten, Breda, NL;
Wilhelmus Josephus Box, Eksel, BE;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Leon Martin Levasier, Hedel, NL;
Erik Roelof Loopstra, Heeze, NL;
Marcel Johannus Elisabeth Hubertus Muitjens, Nuth, NL;
Luberthus Ouwehand, 's-Hertogenbosch, NL;
Leon Joseph Marie Van Den Schoor, 's-Hertogenbosch, NL;
Marcel Beckers, Eindhoven, NL;
Rob Jansen, Veldhoven, NL;
Elke Van Loenhout, Asten, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.