The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2016
Filed:
Dec. 30, 2014
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Jeroen Johannes Sophia Maria Mertens, Knegsel, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Hans Jansen, Eindhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Leon Joseph Marie Van Den Schoor, 's-Hertogenbosch, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Bob Streefkerk, Tilburg, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01);
Abstract
In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.