Leo H Chiang

Title: The Innovative Contributions of Leo H Chiang

Introduction

Leo H Chiang is a notable inventor based in Pearland, TX (US), recognized for his contributions to the field of chemical mechanical polishing. With a total of 3 patents, he has made significant advancements in the analysis and manufacturing of polishing materials.

Latest Patents

Chiang's latest patents include a "Polishing Layer Analyzer and Method," which is designed to detect macro inhomogeneities in polymeric sheets and classify them as either acceptable or suspect. Another important patent is the "Method of Manufacturing Chemical Mechanical Polishing Pads," which outlines an automated inspection system that identifies macro inhomogeneities in skived sheets, ensuring that only acceptable sheets are processed into polishing layers for chemical mechanical polishing pads.

Career Highlights

Throughout his career, Leo H Chiang has worked with prominent companies such as Rohm and Haas Electronic Materials CMP Holdings, Inc. and Dow Global Technologies LLC. His work in these organizations has contributed to the development of innovative solutions in the polishing industry.

Collaborations

Chiang has collaborated with notable professionals in his field, including Francis V Acholla and Andrew Wank. These collaborations have further enhanced his contributions to the industry.

Conclusion

Leo H Chiang's innovative work and patents have significantly impacted the field of chemical mechanical polishing. His dedication to advancing technology in this area continues to inspire future developments.