Company Filing History:
Years Active: 2020-2022
Title: Leilei Hu: Innovator in Atomic Layer Deposition Technology
Introduction
Leilei Hu is a prominent inventor based in Almere, Netherlands. He has made significant contributions to the field of atomic layer deposition, a critical technology in various industries, including semiconductor manufacturing. With a total of 2 patents, Hu's work is recognized for its innovative approach to processing substrates.
Latest Patents
Leilei Hu's latest patents focus on an atomic layer deposition apparatus and methods for processing substrates. The first patent describes an atomic layer deposition apparatus that features a series of high-pressure gas injection openings and exhaust openings. These components are strategically positioned to create a high-pressure/suction zone within each purge gas zone. This design ensures that the average pressure within the high-pressure/suction zone deviates less than 30% from a reference pressure defined by the average pressure within the process tunnel when no substrate is present.
Career Highlights
Hu is currently employed at ASM International N.V., a leading company in the field of semiconductor equipment. His work at ASM International has allowed him to further develop his expertise in atomic layer deposition technology, contributing to advancements that enhance manufacturing processes.
Collaborations
Leilei Hu collaborates with Ernst Hendrik August Granneman, a fellow innovator in the field. Their partnership exemplifies the collaborative spirit that drives innovation in technology.
Conclusion
Leilei Hu's contributions to atomic layer deposition technology highlight his role as a key inventor in the industry. His patents and work at ASM International N.V. demonstrate his commitment to advancing technology in substrate processing.