Company Filing History:
Years Active: 2020
Title: Lei Guo: Innovator in High-Temperature Cleaning Technologies
Introduction
Lei Guo is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of semiconductor processing. With a focus on high-temperature cleaning technologies, he has been awarded 2 patents that enhance the efficiency and effectiveness of cleaning processes in manufacturing environments.
Latest Patents
Guo's latest patents include a method and system for high-temperature cleaning. This invention relates to systems and methods designed to prevent free radical damage to sensitive components within a process chamber. The innovative processing chamber utilizes a cover substrate on lift pins and an inert bottom purge flow to shield the substrate support from halogen reactants. During the cleaning process, the cover substrate and the purge flow restrict halogen reactants from contacting the substrate support. The method involves placing a cover substrate on lift pins, raising it to expose a space between the cover substrate and the substrate support, and supplying a halogen-containing gas along with a second gas to optimize the cleaning process.
Another significant patent focuses on depositing pure silicon oxide on a substrate using Octamethylcyclotetrasiloxane (OMCTS) precursor. This method includes positioning a substrate in a processing chamber, introducing an oxygen-containing gas, and reacting it with the OMCTS precursor to remove carbon and deposit pure silicon oxide on the substrate.
Career Highlights
Lei Guo is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has been instrumental in advancing technologies that improve manufacturing processes and reduce costs.
Collaborations
Guo collaborates with talented professionals such as Praket Prakash Jha and Deenesh Padhi, contributing to a dynamic and innovative work environment.
Conclusion
In summary, Lei Guo is a prominent inventor whose work in high-temperature cleaning technologies has led to significant advancements in semiconductor processing. His contributions continue to shape the industry and enhance manufacturing efficiency.