Location History:
- Taipei, TW (2004)
- Hsinchu, TW (2004)
Company Filing History:
Years Active: 2004
Title: Lee-Jen Chen: Innovator in Semiconductor Technology
Introduction
Lee-Jen Chen is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of isolation processes. With a total of 2 patents, Chen's work has had a notable impact on the industry.
Latest Patents
Chen's latest patents include a shallow trench isolation process and methods for filling shallow trench isolations having high aspect ratios. The shallow trench isolation process describes a method where a patterned mask layer is formed on a substrate, followed by the creation of a trench using the mask as a guide. The process involves removing portions of the mask layer and substrate, forming a liner layer in the trench, and filling the trench with insulating material. The second patent focuses on forming an isolation trench for integrated circuits, detailing the steps of providing a semiconductor substrate, removing layers to create a trench, and forming fill layers within the trench.
Career Highlights
Lee-Jen Chen is currently employed at Macronix International Co., Ltd., where he continues to innovate in semiconductor technologies. His expertise in shallow trench isolation processes has positioned him as a key figure in the development of advanced semiconductor manufacturing techniques.
Collaborations
Chen has collaborated with notable coworkers, including Chin-Hsiang Lin and Yung-Tai Hung, who contribute to the innovative environment at Macronix International Co., Ltd. Their teamwork fosters advancements in semiconductor technology.
Conclusion
Lee-Jen Chen's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to shape the future of integrated circuit manufacturing.