Lee Jea Sik

Title: Lee Jea Sik: Innovator in Siloxan Polymer Technology

Introduction

Lee Jea Sik is a prominent inventor based in Tama, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative work on siloxan polymer films. With a total of 2 patents, his inventions are paving the way for advancements in insulation materials used in electronics.

Latest Patents

Lee Jea Sik's latest patents focus on the development of siloxan polymer films on semiconductor substrates. These films possess a dielectric constant of 3.1 or lower and feature repeating structural units of —SiR O— with a carbon atom concentration of 20% or less. The siloxan polymer exhibits high thermal stability and humidity resistance, making it ideal for various applications in the semiconductor industry. The process for forming these films involves directly vaporizing a silicon-containing hydrocarbon compound and introducing it into a plasma CVD apparatus, which allows for the creation of a micropore porous structure with a low dielectric constant.

Career Highlights

Lee Jea Sik is currently employed at Asm Japan K.K., where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the performance and reliability of semiconductor devices.

Collaborations

Some of his notable coworkers include Nobuo Matsuki and Yoshinori Morisada, who have collaborated with him on various projects within the company.

Conclusion

Lee Jea Sik's contributions to the field of semiconductor technology through his patents on siloxan polymer films demonstrate his commitment to innovation and excellence. His work is expected to have a lasting impact on the industry.