Wuxi, China

Le Wang

USPTO Granted Patents = 5 

Average Co-Inventor Count = 1.4

ph-index = 1


Location History:

  • Wuxi New District, CN (2014)
  • Wuxi, CN (2013 - 2015)

Company Filing History:


Years Active: 2013-2015

Loading Chart...
5 patents (USPTO):

Title: The Innovative Mind of Le Wang: A Glimpse into His Contributions

Introduction

Le Wang is a distinguished inventor based in Wuxi, China, recognized for his innovative contributions to the field of semiconductor technologies. With a remarkable portfolio of five patents, he has demonstrated a commitment to advancing the technologies that form the backbone of modern electronics.

Latest Patents

Wang's recent patents reflect his expertise in the fabrication of MOS devices and double-gate structures. The first notable patent is for a "Method for Fabricating Small-Scale MOS Device," which involves various complex steps including the preparation of a substrate, formation of trenches, and the Sourcing and Doping of drain regions. This invention significantly enhances the efficiency and performance of small-scale MOS devices.

His second key patent, "Method for Manufacturing Double-Gate Structures," covers a novel approach to creating double-gate structures. This method involves multiple stages including forming a first and second gate region, as well as an etch-stop layer to ensure precision during the etching process. Such innovations are vital for improving the capabilities of modern semiconductor devices.

Career Highlights

Throughout his career, Le Wang has had the opportunity to work with noteworthy companies like CSMC Technologies Fab1 Co., Ltd. and CSMC Technologies Fab2 Co., Ltd. His experiences in these reputable institutions have contributed significantly to his expertise in semiconductor manufacturing processes. Wang's inventive spirit is reflected in his ability to innovate and enhance production techniques in a rapidly evolving industry.

Collaborations

In his journey as an inventor, Le Wang has collaborated with talented professionals such as Linchun Gui and Zhiyong Zhao. These collaborations underscore the importance of teamwork in the innovation process, as diverse perspectives often lead to groundbreaking ideas and advancements in technology.

Conclusion

Le Wang stands out as an inspiring figure in the semiconductor research landscape. His five patents, particularly his methods for fabricating MOS devices and double-gate structures, illustrate his commitment to innovation and excellence. As technology continues to evolve, Wang’s contributions pave the way for future developments in the semiconductor industry, showcasing the indispensable role of inventors in shaping our technological future.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…