Portland, OR, United States of America

Lawrence H Walls

This inventor holds 1 USPTO granted patent. Top assignee: Advanced Inquiry Systems, Inc.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lawrence H Walls. Retrieved from https://idiyas.com/inventor/lawrence-h-walls

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Innovations by Lawrence H Walls

Introduction

Lawrence H Walls is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of integrated circuits through his innovative patent. His work focuses on improving the testing processes of integrated circuits, which is crucial for the advancement of technology.

Latest Patents

Lawrence H Walls holds a patent titled "Methods and apparatus for collecting process characterization data after first failure in a group of tested devices." This patent involves a method for collecting process characterization data local to a failed integrated circuit (IC). The process includes providing a wafer with ICs, selecting multiple ICs for simultaneous testing, and utilizing multiplexers to collect data efficiently after detecting a failure.

Career Highlights

Lawrence is associated with Advanced Inquiry Systems, Inc., where he applies his expertise in integrated circuit testing. His innovative approach has led to advancements in the reliability and efficiency of testing processes in the semiconductor industry.

Collaborations

He has collaborated with notable colleagues such as Morgan T Johnson and Raymond J Werner, contributing to the development of cutting-edge technologies in their field.

Conclusion

Lawrence H Walls is a distinguished inventor whose work has significantly impacted the testing of integrated circuits. His innovative patent demonstrates his commitment to enhancing technology and improving processes within the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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