Munich, Germany

Laurent Emmerich

This inventor holds 1 USPTO granted patent. Top assignee: Nxp USA, Inc.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Laurent Emmerich. Retrieved from https://idiyas.com/inventor/laurent-emmerich

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Laurent Emmerich: Innovator in 3D Object Display Technology

Introduction

Laurent Emmerich is a notable inventor based in Munich, Germany. He has made significant contributions to the field of 3D object display technology. His innovative approach has led to the development of a unique method for estimating fragment counts in 3D displays.

Latest Patents

Laurent Emmerich holds a patent for a "Method and apparatus for estimating a fragment count for the display of at least one three-dimensional object." This method involves determining an ellipsoid representative of a set of vertices defined by coordinates of the 3D object. It includes applying a transformation to the ellipsoid, calculating a projection area of the transformed ellipsoid, and estimating the fragment count based on the calculated projection area.

Career Highlights

Emmerich is currently associated with NXP USA, Inc., where he continues to work on advancements in technology related to 3D displays. His expertise in this area has positioned him as a valuable asset to his company and the industry.

Collaborations

One of his notable coworkers is Robert Cristian Krutsch, with whom he collaborates on various projects within the company.

Conclusion

Laurent Emmerich's innovative work in estimating fragment counts for 3D object displays showcases his expertise and commitment to advancing technology. His contributions are significant in the realm of 3D visualization and display methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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