This inventor holds 1 USPTO granted patent. Top assignee: Synopsys, Inc.. Active years: 2010.
Company Filing History:
Years Active: 2010
Title: Laurent Depre - Innovator in Optical Lithography
Introduction
Laurent Depre is a notable inventor based in Revel, France. He has made significant contributions to the field of optical lithography, particularly in the modeling of apodization effects. His work is essential for the advancement of integrated circuit manufacturing.
Latest Patents
Laurent Depre holds a patent for a "Method and apparatus for modeling an apodization effect in an optical lithography system." This invention provides a system that accurately predicts the apodization effect in optical lithography systems used for manufacturing integrated circuits. The system collects an apodization-effect-induced spatial transmission profile and constructs an apodization model based on this profile. It then enhances a lithography model by incorporating the apodization model, allowing for accurate predictions of apodization effects.
Career Highlights
Laurent Depre is associated with Synopsys, Inc., a leading company in electronic design automation. His work at Synopsys has been pivotal in improving the efficiency and accuracy of optical lithography processes.
Collaborations
Laurent has collaborated with notable colleagues such as Paul VanAdrichem and Qiliang Yan. Their combined expertise has contributed to advancements in the field of optical lithography.
Conclusion
Laurent Depre's innovative work in optical lithography and his patent for modeling apodization effects highlight his significant role in the advancement of integrated circuit manufacturing. His contributions continue to influence the industry positively.