Fremont, CA, United States of America

Larry Gao

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020-2025

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4 patents (USPTO):

Title: Innovations of Larry Gao in Lithography Applications

Introduction

Larry Gao is an accomplished inventor based in Fremont, CA, known for his significant contributions to the field of lithography applications. With a total of four patents to his name, Gao has made strides in enhancing the efficiency and effectiveness of photoresist layers used in various technological applications.

Latest Patents

One of Larry Gao's latest patents focuses on the selective deposition of carbon on photoresist layers for lithography applications. This innovative method involves etching a hardmask layer by first forming a photoresist layer that comprises an organometallic material on a hardmask layer made of a metal-containing material. The process includes exposing the photoresist layer to ultraviolet radiation through a mask with a specific pattern, followed by the removal of un-irradiated areas to create a patterned photoresist layer. Subsequently, a passivation layer made of a carbon-containing material is selectively formed on the top surface of the patterned photoresist layer. The final steps involve trimming undesired portions of the passivation material and etching the hardmask layer that is exposed by the patterned photoresist layer.

Career Highlights

Larry Gao is currently employed at Applied Materials, Inc., where he continues to develop innovative solutions in the field of materials engineering. His work has been instrumental in advancing lithography techniques, which are crucial for the manufacturing of semiconductor devices.

Collaborations

Some of Larry Gao's notable coworkers include Nancy Fung and Gene S Lee, who collaborate with him on various projects within Applied Materials, Inc.

Conclusion

Larry Gao's contributions to the field of lithography through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and pave the way for future innovations.

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