Larry Chang

Title: Larry Chang: Innovator in Substrate Support Technology

Introduction

Larry Chang is a notable inventor based in Los Altos, CA (US). He has made significant contributions to the field of substrate support technology, holding a total of 3 patents. His work focuses on minimizing deflection during thermal expansion in processing chambers, which is crucial for various industrial applications.

Latest Patents

One of Larry Chang's latest patents is a support frame for substrates. This invention provides a system and method for supporting a substrate with a design that minimizes deflection encountered during thermal expansion in a processing chamber. In one embodiment, the support frame comprises one or more longitudinal members coupled to one or more transverse members. The transverse members define a supporting surface on which a heated susceptor is mounted. The longitudinal member is positioned below the heated susceptor, thereby minimizing its thermal expansion. Additionally, spacers made of thermally conductive material are strategically placed along the members to ensure a more uniform distribution of heat.

Career Highlights

Larry Chang is currently employed at Applied Komatsu Technology, Inc. His innovative work has garnered attention in the industry, and he continues to push the boundaries of substrate support technology.

Collaborations

Some of his notable coworkers include John M White and Emanuel Beer. Their collaborative efforts contribute to the advancement of technology within their field.

Conclusion

Larry Chang's contributions to substrate support technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of thermal dynamics and engineering principles, making him a valuable asset in his industry.