Geldrop, Netherlands

Lambertus Adrianus Wildenberg

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lambertus Adrianus Wildenberg. Retrieved from https://idiyas.com/inventor/lambertus-adrianus-wildenberg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Lambertus Adrianus Wildenberg: Pioneering Innovations in Optics

Introduction:

Lambertus Adrianus Wildenberg, a talented inventor hailing from Geldrop, Netherlands, has made significant contributions to the field of optics with his groundbreaking inventions.

Latest Patents:

Wildenberg holds a notable patent for the "Ex-situ removal of deposition on an optical element." This patent showcases a collector assembly with innovative features designed to enhance the cleaning process of radiation collectors, ultimately improving their efficiency and longevity.

Career Highlights:

Currently associated with the renowned company ASML Netherlands B.V., Lambertus Adrianus Wildenberg continues to push the boundaries of innovation in optical technologies. His expertise and dedication have led to the development of cutting-edge solutions in the field.

Collaborations:

In his professional journey, Wildenberg has collaborated closely with esteemed colleagues such as Vadim Yevgenyevich Banine and Vladimir Mikhailovich Krivtsun. Together, they have synergized their skills and knowledge to drive forward advancements in optical engineering.

Conclusion:

In conclusion, Lambertus Adrianus Wildenberg stands out as a visionary inventor who has revolutionized the realm of optics with his inventive solutions. His relentless pursuit of innovation and collaboration with talented peers underscores his commitment to pushing the boundaries of technological advancement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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