Jeffersonville, VT, United States of America

Laird Chandler MacDowell

This inventor holds 3 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 2001-2003.


% Patents Active = 66.7

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2001-2003

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3 patents (USPTO):Explore Patents

Title: Laird Chandler MacDowell: Innovator in Photoresist Technology

Introduction

Laird Chandler MacDowell is a notable inventor based in Jeffersonville, VT (US). He has made significant contributions to the field of semiconductor processing through his innovative patents. With a total of 3 patents, MacDowell continues to push the boundaries of technology.

Latest Patents

One of MacDowell's latest patents is focused on the controlled aging of photoresists for faster photospeed. This method provides an aged photoresist that achieves a targeted photospeed faster than a conventional unaged photoresist. The process involves aging a solution containing a photoresist resin composition at a temperature below its thermal decomposition, but not below 20°C, for a time period effective in achieving the desired photospeed. Another significant patent involves the detection of a gaseous substance emanating from a layer of polymeric composition. This invention allows for the detection of an evolving or diffusing gaseous substance from an irradiated or thermolyzed layer, which is crucial in semiconductor processing.

Career Highlights

MacDowell is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to develop and refine his innovative ideas in the field of photoresist technology.

Collaborations

Throughout his career, MacDowell has collaborated with notable colleagues such as James Patrick Collins and Wayne Martin Moreau. These collaborations have contributed to the advancement of technology in their respective fields.

Conclusion

Laird Chandler MacDowell is a distinguished inventor whose work in photoresist technology has made a significant impact on semiconductor processing. His innovative patents and collaborations highlight his commitment to advancing technology.

Profile summary based on public USPTO records.
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