International Business Machines Corporation

Laird Chandler MacDowell

Wayne Martin Moreau

James Patrick Collins

Michael Santarelli

Erik A Puttlitz

A method for the controlled aging of a photoresist which provides an aged photoresist that has a targeted photospeed which is faster than a conventional unaged photoresist is provided. Specifically, the inventive method includes the step of aging a solution containing at least a photoresist resin composition at a temperature below the thermal decomposition of the photoresist resin composition, but not below 20&deg; C., for a time period that is effective in achieving a targeted photospeed which is faster than a photospeed of an unaged photoresist.

Controlled aging of photoresists for faster photospeed

Detection of an evolving or diffusing gaseous substance emanating from an irradiated or thermolyzed layer of polymeric composition in semiconductor processing or similar processes is disclosed. The evolving or diffusing gaseous substance is detected by spatially disposing from the irradiated or thermolyzed layer a detector layer that includes a compound having leaving groups that are sensitive to the gaseous substance being detected.

Growing community of inventors

Jeffersonville, VT, United States of America

Laird Chandler MacDowell