Kyung-moon Byun

Title: The Innovative Mind of Kyung-moon Byun: A Pioneer in Semiconductor Microstructures

Introduction: Kyung-moon Byun is an accomplished inventor based in Seoul, South Korea, with a profound contribution to the field of semiconductor technology. His innovative spirit has led him to develop a patented method that enhances the fabrication of semiconductor microstructures.

Latest Patents: Byun holds a patent for a "Method of fabricating a semiconductor microstructure." This method includes several intricate steps such as forming a lower material layer on a semiconductor substrate, which consists of a nitride of a Group III-element. Following this, a mold material layer is created atop the lower material layer. Byun's method employs an etching mask for constructing a structure within the mold material layer, followed by an anisotropic etching process of both the mold and lower material layers, and a subsequent isotropic etching stage.

Career Highlights: Currently, Kyung-moon Byun works at Samsung Electronics Co., Ltd., one of the leading technology companies globally. His role focuses on advancing semiconductor technology, a critical area in the company's ongoing research and development efforts. His contributions are vital in enhancing the performance and efficiency of semiconductor devices.

Collaborations: Throughout his career, Byun has collaborated with notable coworkers, including YongSoon Choi and Eunkee Hong. These partnerships highlight the importance of teamwork and collective expertise in advancing innovative projects and achieving technological breakthroughs.

Conclusion: Kyung-moon Byun stands out as a significant figure in the realm of semiconductor inventions. His patented method of fabricating semiconductor microstructures not only showcases his ingenuity but also underlines the vital role played by inventors in shaping the future of technology. As he continues his work at Samsung Electronics, the industry eagerly anticipates further innovations that will emerge from his expertise.