Samsung Electronics Co., Ltd.

Kyung-moon Byun

Eunkee Hong

Eun-kyung Baek

YongSoon Choi

Provided is a method of fabricating a semiconductor microstructure, the method including forming a lower material layer on a semiconductor substrate, the lower material layer including a nitride of a Group III-element; forming a mold material layer on the lower material layer; forming an etching mask on the mold material layer, the etching mask being for forming a structure in the mold material layer; anisotropic-etching the mold material layer and the lower material layer by using the etching mask; and isotropic-etching the mold material layer and the lower material layer.

Growing community of inventors

Seoul, South Korea

Kyung-moon Byun