Company Filing History:
2 out of 131,766 
2 out of 6 Years Active: 2018-2025
Title: Kyoungchae Seo: Innovator in EUV Mask Technology
Introduction
Kyoungchae Seo is a notable inventor based in Osan-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of technologies related to extreme ultraviolet (EUV) masks. With a total of 2 patents to his name, Seo's work is pivotal in advancing the efficiency and effectiveness of photomask technologies.
Latest Patents
Seo's latest patents include innovative methods for removing adhesives used in EUV masks and for reusing these masks. One of his patents describes an adhesive composition that consists of an epoxy resin and an inorganic filler, specifically designed to enhance the performance of EUV masks. The adhesive comprises an epoxy resin composition in an amount of 50 wt % to 80 wt % and an inorganic filler, such as aluminum hydroxide or calcium carbonate, in an amount of 20 wt % to 50 wt %. Another patent focuses on a pellicle that includes a water-soluble adhesive, which is crucial for maintaining the integrity of photomask assemblies during the manufacturing process.
Career Highlights
Throughout his career, Kyoungchae Seo has worked with prominent companies in the technology sector. He has been associated with Samsung Electronics Co., Ltd. and Fine Semitech Corporation, where he has contributed to various projects that enhance semiconductor manufacturing processes. His expertise in adhesive technologies has positioned him as a key player in the industry.
Collaborations
Seo has collaborated with several professionals in his field, including Byungchul Yoo and Myungjun Kim. These collaborations have fostered innovation and have led to advancements in the technologies related to EUV masks.
Conclusion
Kyoungchae Seo's contributions to the field of semiconductor technology, particularly through his patents and collaborations, highlight his role as an influential inventor. His work continues to impact the efficiency of EUV mask technologies, paving the way for future innovations in the industry.