Kyohei Degura

Title: Kyohei Degura: Innovator in Semiconductor Technology

Introduction

Kyohei Degura is a prominent inventor based in Fuchu, Japan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to manufacturing semiconductor laminated films.

Latest Patents

Degura's latest patents include a manufacturing method for semiconductor laminated film and the semiconductor laminated film itself. The semiconductor laminate film consists of a silicon substrate with a semiconductor layer formed on it, containing both silicon and germanium. This semiconductor layer is characterized by a surface roughness Rms of 1 nm or less. Furthermore, it adheres to a specific relationship where the thickness (t) of the semiconductor layer is less than or equal to 0.881 times the ratio (x) of germanium atoms to the total number of silicon and germanium atoms in the layer.

The manufacturing method involves producing the semiconductor laminate film by a sputtering method. In this process, the film formation temperature is kept below 500°C, with a film formation pressure ranging from 1 mTorr to 11 mTorr. Alternatively, the temperature can be less than 600°C, with a pressure of 2 mTorr to less than 5 mTorr. The sputtering method utilizes a gas mixture with less than 0.1% hydrogen, ensuring that the semiconductor layer meets the thickness-to-atom ratio relationship.

Career Highlights

Throughout his career, Kyohei Degura has worked with esteemed institutions such as the Tokyo University of Agriculture and Technology and the National Institute of Information and Communications Technology. His work has significantly advanced the understanding and production of semiconductor materials.

Collaborations

Degura has collaborated with notable colleagues, including Yoshiyuki Suda and Takahiro Tsukamoto, contributing to various projects in semiconductor research and development.

Conclusion

Kyohei Degura's innovative work in semiconductor technology has led to advancements that are crucial for the industry. His patents reflect a deep understanding of material science and manufacturing processes, positioning him as a key figure in the field.