Hong Kong, China

Kwok Wai Yee

This inventor holds 3 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Rohm & Haas Electronic Materials LLC. Active years: 2017-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kwok Wai Yee. Retrieved from https://idiyas.com/inventor/kwok-wai-yee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017-2018

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3 patents (USPTO):Explore Patents

Title: Kwok Wai Yee: Innovator in Selective Metallization

Introduction

Kwok Wai Yee is a prominent inventor based in Hong Kong, CN. He has made significant contributions to the field of materials science, particularly in the area of selective metallization. With a total of 3 patents to his name, his work has garnered attention for its innovative approaches and practical applications.

Latest Patents

One of Kwok Wai Yee's latest patents is focused on a shielding coating for selective metallization. This invention involves applying shielding coatings to polymer substrates, which include a primer component and a hydrophobic top coat. The primer is first applied to the polymer substrate, followed by the application of the top coat component. The shielding coating is then selectively etched to form an outline of a desired current pattern. A catalyst is applied to the patterned polymer substrate, followed by electroless metal plating in the etched portions. The portions of the polymer substrate that contain the shielding coating inhibit electroless metal plating. The primers contain polyamines, while the top coat consists of hydrophobic alky organic compounds. Another similar patent also focuses on shielding coatings, utilizing five-membered heterocyclic nitrogen compounds in the primers.

Career Highlights

Kwok Wai Yee is currently employed at Rohm & Haas Electronic Materials LLC, where he continues to develop innovative materials and processes. His work has been instrumental in advancing the capabilities of selective metallization techniques, which are crucial in various electronic applications.

Collaborations

Throughout his career, Kwok has collaborated with notable colleagues, including Hung Tat Chan and Ka Ming Yip. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Kwok Wai Yee's contributions to the field of selective metallization highlight his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to developing practical solutions that have a lasting impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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