This inventor holds 1 USPTO granted patent. Top assignee: Globalfoundries Singapore Pte. Ltd.. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Kwee Liang Martin Yeo: Innovator in Optical Proximity Correction Technology
Introduction
Kwee Liang Martin Yeo is a notable inventor based in Singapore, SG. He has made significant contributions to the field of optical proximity correction technology. His innovative work has led to the development of a unique mask system that enhances manufacturing processes in the semiconductor industry.
Latest Patents
Kwee Liang Martin Yeo holds 1 patent for his invention titled "Mask system employing substantially circular optical proximity correction target and method of manufacture thereof." This patent outlines a method of manufacturing a mask system that includes providing design data, generating a substantially circular optical proximity correction target from the design data, biasing a segment of the target, and generating mask data based on the modified shape.
Career Highlights
He is currently employed at Globalfoundries Singapore Pte. Ltd., where he applies his expertise in semiconductor manufacturing. His work focuses on improving the efficiency and accuracy of mask systems used in the production of integrated circuits.
Collaborations
Kwee Liang Martin Yeo collaborates with talented colleagues such as Sia Kim Tan and Gek Soon Chua. Together, they contribute to advancements in semiconductor technology and innovation.
Conclusion
Kwee Liang Martin Yeo's contributions to optical proximity correction technology exemplify the impact of innovative thinking in the semiconductor industry. His work continues to influence manufacturing processes and drive technological advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile