The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2013
Filed:
May. 13, 2009
Sia Kim Tan, Singapore, SG;
Gek Soon Chua, Singapore, SG;
Kwee Liang Martin Yeo, Singapore, SG;
Ryan Khoon Khye Chong, Singapore, SG;
Moh Lung Ling, Singapore, SG;
Sia Kim Tan, Singapore, SG;
Gek Soon Chua, Singapore, SG;
Kwee Liang Martin Yeo, Singapore, SG;
Ryan Khoon Khye Chong, Singapore, SG;
Moh Lung Ling, Singapore, SG;
Globalfoundries Singapore Pte. Ltd., Singapore, SG;
Abstract
A method of manufacture of a mask system includes: providing design data; generating a substantially circular optical proximity correction target from the design data; biasing a segment of the substantially circular optical proximity correction target; and generating mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target.