Kwang Seon Jin

Title: Kwang Seon Jin: Innovator in Substrate Processing Technologies

Introduction

Kwang Seon Jin is a prominent inventor based in Incheon, South Korea. He has made significant contributions to the field of substrate processing, holding a total of five patents. His innovative work focuses on methods and apparatuses that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

One of Kwang Seon Jin's latest patents is a substrate processing method. This method utilizes a substrate processing apparatus that includes a process chamber defining a processing space. The apparatus features a substrate support for placing a substrate, a gas sprayer for supplying process gas, and a remote plasma generator connected to the process chamber. The method involves placing the substrate on the support, continuously supplying a surface processing gas through the remote plasma generator, and activating the gas with plasma power. It also includes a step of supplying an etching gas onto the substrate after cutting off the plasma power.

Another notable patent is the method and apparatus for atomic layer etching. This method includes providing a substrate with a material to be etched, controlling the substrate at a specific temperature, and modifying the surface layer of the material by supplying a modifying gas. The etching step involves controlling the substrate at a different temperature to remove the modified surface layer using an etching gas.

Career Highlights

Kwang Seon Jin is currently employed at Wonik IPS Co., Ltd., where he continues to develop innovative technologies in substrate processing. His work has significantly impacted the industry, leading to advancements in manufacturing processes.

Collaborations

Kwang Seon Jin collaborates with talented coworkers, including Byung Chul Cho and Jin Sung Chun. Their combined expertise fosters a creative environment that drives innovation in their projects.

Conclusion

Kwang Seon Jin is a distinguished inventor whose contributions to substrate processing technologies are noteworthy. His patents reflect a commitment to advancing the field and improving manufacturing processes. His work continues to inspire innovation in the industry.