The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2019
Filed:
Nov. 17, 2017
Applicant:
Wonik Ips Co., Ltd., Pyeongtaek-si Gyeonggi-do, KR;
Inventors:
Byung Chul Cho, Hwaseong-si, KR;
Sang Jin Lee, Pyeongtaek-si, KR;
In Hwan Yi, Suwon-si, KR;
Kwang Seon Jin, Incheon, KR;
Assignee:
WONIK IPS CO., LTD., Pyeongtaek-si, Gyeonnggi, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/455 (2006.01); C23C 16/04 (2006.01); H01L 21/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0228 (2013.01); C23C 16/045 (2013.01); C23C 16/45527 (2013.01); C23C 16/45534 (2013.01); H01L 21/02112 (2013.01); H01L 21/02126 (2013.01); H01L 21/02142 (2013.01); H01L 21/02164 (2013.01); H01L 21/02274 (2013.01); H01L 21/02642 (2013.01); H01L 21/32 (2013.01); H01L 21/0243 (2013.01); H01L 21/02639 (2013.01);
Abstract
In a method of deposition a thin film, a substrate having a pattern may be provided. A surface of the substrate may be treated using a deposition-suppressing gas to form a deposition-suppressing layer on the pattern. A process gas may be applied to the pattern to deposit the thin film. The deposition-suppressing gas may include fluorine.