Company Filing History:
Years Active: 2017-2024
Title: Innovations by Inventor Byung Chul Cho
Introduction
Byung Chul Cho, residing in Hwaseong-si, South Korea, is an accomplished inventor renowned for his contributions to substrate processing and atomic layer etching technologies. With a total of six patents to his name, Cho has made significant advancements that enhance efficiency and precision in semiconductor manufacturing.
Latest Patents
One of Cho's latest patents is a novel substrate processing method. This method utilizes a substrate processing apparatus, which includes a process chamber that defines a processing space. The innovation incorporates a substrate support mechanism for placing substrates and a gas sprayer that supplies process gas into the processing space. Additionally, a remote plasma generator connected to the process chamber plays a crucial role in the processing method. The procedure involves placing the substrate on the support, continuously supplying a surface processing gas and a purge gas, activating them with plasma power, and subsequently providing an etching gas to complete the process.
Another significant patent is for a method of atomic layer etching, where Cho outlines a systematic approach for modifying and etching materials on a substrate. This method includes controlling the substrate temperature to modify the surface layer and then removing it through a precisely controlled etching gas application, demonstrating Cho's innovative thinking in materials processing.
Career Highlights
Byung Chul Cho is currently affiliated with Wonik IPS Co., Ltd., a company known for its cutting-edge technology in the semiconductor industry. His career reflects a strong commitment to enhancing technological processes and improving product performance through inventive methodologies.
Collaborations
Throughout his career, Cho has collaborated with talented individuals such as Kwang Seon Jin and Jin Sung Chun. This teamwork showcases the importance of collaboration in the innovation process and the sharing of knowledge and ideas within the field.
Conclusion
Byung Chul Cho's contributions to the field of substrate processing and atomic layer etching exemplify the impactful work that can arise from dedicated research and innovation. His patents not only highlight his ingenuity but also represent significant advancements in semiconductor manufacturing technologies, paving the way for future innovations.