Kuo Wei Wu

Title: The Innovative Mind of Kuo Wei Wu

Introduction

Kuo Wei Wu is a notable inventor based in Tokyo, Japan, recognized for his contributions to the field of protective film technologies. With a singular patent to his name, he has demonstrated a capacity for innovation that is both impactful and technically sophisticated.

Latest Patents

His patent, titled "Protective Film Thickness Measuring Method," outlines a systematic approach to measuring the thickness of protective films on semiconductor wafers. The method involves a series of steps: initially applying light to a bare wafer to capture a first reflection intensity, followed by the formation of a protective film composed of a light-absorbing material. The process continues with the irradiation of this film using specific wavelengths that induce fluorescence. By measuring the second reflection intensity that encompasses both the fluorescence and reflections from the wafer's top surface, Wu's method efficiently excludes contributions from surface patterns, thereby enabling accurate calculations of the film's fluorescence intensity.

Career Highlights

Kuo Wei Wu's professional journey is closely associated with Disco Corporation, where his innovative work contributes significantly to advancements in semiconductor manufacturing processes. His expertise in material sciences and optical measurements has established him as a valued member of his field.

Collaborations

At Disco Corporation, Wu collaborates with esteemed colleagues such as Hiroto Yoshida and Nobuyasu Kitahara. Together, they contribute to breakthroughs in semiconductor technologies, showcasing a spirit of teamwork that enhances their research and development efforts.

Conclusion

Kuo Wei Wu exemplifies the spirit of innovation in the technology sector. His patent for a protective film thickness measuring method not only reflects his technical prowess but also serves as a vital tool in advancing semiconductor manufacturing processes. With continued collaboration and research, Wu is poised to make further contributions to the field, solidifying his legacy as an influential inventor in Japan and beyond.