Location History:
- Taichung, TW (2008 - 2016)
- Miaoli County, TW (2015 - 2016)
Company Filing History:
7 out of 7,082 
1 out of 119 Years Active: 2008-2016
Title: The Innovative Contributions of Kuo-Hsun Huang
Introduction
Kuo-Hsun Huang is a prominent inventor based in Taichung, Taiwan, known for his significant contributions to the field of optical proximity correction and design methodologies. With a total of seven patents to his name, his work is instrumental in enhancing semiconductor manufacturing and design processes.
Latest Patents
Among Kuo-Hsun Huang's latest patents is the "Optical Proximity Correction Verification System and Verification Method Thereof." This innovative method involves several steps, including loading layout data into a processor and performing Boolean operations to verify the data against reference layouts. The process also includes layout versus layout verification using user-defined tools, leading to the creation of refined verification data.
Another notable patent is the "Planar Design to Non-Planar Design Conversion Method," which outlines a systematic approach to converting diffusion region patterns into fin patterns using computer-aided design (CAD) tools. This method enhances the efficiency of semiconductor designs by utilizing lookup tables and predefined values.
Career Highlights
Kuo-Hsun Huang has built an impressive career working with notable institutions, including United Microelectronics Corporation and National Chung Hsing University. His experience in these prominent organizations has cemented his status as a leading innovator in his field.
Collaborations
Throughout his career, Huang has collaborated with several esteemed professionals, including Chao-Yao Chiang and Chien-Hung Zordius Chen. These collaborations have further enriched his work and contributed to advancements in semiconductor technologies.
Conclusion
Kuo-Hsun Huang continues to make impactful strides in the realm of semiconductor design and verification. His patents and innovative methods are reflective of his dedication to improving industry standards and practices, making him a notable figure in the field of technology and innovation.