Kuo-Chiang TIng

Title: Kuo-Chiang Ting: Innovator in FinFET Technology

Introduction

Kuo-Chiang Ting is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of FinFETs. His innovative work has led to advancements that are crucial for modern electronic devices.

Latest Patents

Kuo-Chiang Ting holds a patent titled "Methods of forming FinFETs." This patent describes a method that includes forming a first fin on a substrate, where the first fin has a first longitudinal axis. The method also involves creating a first trench with a specific width in the first fin, which divides the fin into at least two portions. Additionally, it details the formation of a first gate structure and first source/drain regions over one of the fin portions, as well as a second gate structure and second source/drain regions over the other portion.

Career Highlights

Kuo-Chiang Ting is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has positioned him as a key player in the advancement of FinFET technology, which is essential for enhancing the performance of integrated circuits.

Collaborations

Some of Kuo-Chiang Ting's notable coworkers include Jyh-Huei Chen and Wen-Huei Guo. Their collaborative efforts contribute to the innovative environment at Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Kuo-Chiang Ting's contributions to FinFET technology exemplify the importance of innovation in the semiconductor industry. His patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a significant inventor in this field.