Kunio Kishida

Title: Kunio Kishida: Innovator in Alloy Technology

Introduction

Kunio Kishida is a notable inventor based in Ohmiya, Japan. He has made significant contributions to the field of alloy technology, holding a total of 5 patents. His work primarily focuses on the development of advanced materials for various applications.

Latest Patents

Kishida's latest patents include a platinum-cobalt alloy sputtering target and a method for manufacturing the same. This sputtering target contains 10 to 55% by weight of platinum, along with specific amounts of additional elements such as nickel and tantalum. The manufacturing method involves preparing a platinum-cobalt alloy and subjecting it to hot and cold plastic working processes. Another notable patent is for a copper alloy that exhibits high resistance to oxidation, specifically designed for use in leads on semiconductor devices. This alloy consists of 7-15 wt % manganese, 10-30 wt % zinc, and other elements, ensuring high electrical conductivity and good heat dissipation.

Career Highlights

Throughout his career, Kunio Kishida has worked with prominent companies such as Mitsubishi Kinzoku Kabushiki Kaisha and Fujitsu Corporation. His experience in these organizations has allowed him to refine his expertise in alloy development and innovation.

Collaborations

Kishida has collaborated with notable coworkers, including Masaki Morikawa and Hideaki Yoshida. Their combined efforts have contributed to advancements in the field of materials science.

Conclusion

Kunio Kishida's innovative work in alloy technology has led to significant advancements in the industry. His patents reflect a commitment to developing materials that enhance the performance of semiconductor devices and other applications.