This inventor holds 5 USPTO granted patents. Top assignee: Tokyo Shibaura Denki Kabushiki Kaisha. Active years: 1981-1985.
Company Filing History:
Years Active: 1981-1985
Title: Kunihiro Ikari: Innovator in Photoresist Technology
Introduction
Kunihiro Ikari is a prominent inventor based in Yokosuka, Japan. He has made significant contributions to the field of photoresist technology, holding a total of five patents. His work focuses on developing advanced materials that enhance the performance of electronic components.
Latest Patents
Ikari's latest patents include a water-soluble photoresist composition that features bisazide, diazo, and polymer components. This innovative composition is characterized by its photosensitivity, particularly to ultraviolet rays, and its excellent adhesion to various substrates. Additionally, he has developed a method for creating a picture tube fluorescent screen, which utilizes a light-sensitive resin and CaS-based phosphor particles. This method allows for the production of picture tubes with superior light-emitting efficiency and contrast.
Career Highlights
Ikari is currently employed at Tokyo Shibaura Denki Kabushiki Kaisha, where he continues to push the boundaries of photoresist technology. His work has been instrumental in advancing the capabilities of electronic displays and other related applications.
Collaborations
Ikari has collaborated with notable colleagues, including Norio Koike and Kazuhiro Takeda. Their combined expertise has contributed to the successful development of innovative technologies in their field.
Conclusion
Kunihiro Ikari's contributions to photoresist technology have established him as a key figure in the industry. His innovative patents and collaborative efforts continue to influence advancements in electronic components.