Sunnyvale, CA, United States of America

Kun Wang

USPTO Granted Patents = 6 

Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 263(Granted Patents)


Company Filing History:


Years Active: 2006-2023

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6 patents (USPTO):Explore Patents

Title: Kun Wang: Innovator in Radio Frequency Technology

Introduction

Kun Wang is a prominent inventor based in Sunnyvale, California. He has made significant contributions to the field of radio frequency technology, holding a total of 6 patents. His work focuses on improving the performance and efficiency of RF devices, which are essential in modern communication systems.

Latest Patents

Among his latest patents, one notable invention is a radio frequency (RF) transistor amplifier package with improved isolation and lead configurations. This innovative package includes a submount with first and second leads extending from one side, designed to provide RF signal connections to one or more transistor dies. The design incorporates at least one rivet attached to the surface of the submount, enhancing the overall performance of the device. Additionally, he has developed bulk acoustic resonator devices, which involve processes for fabricating these devices to ensure they maintain sufficient thickness during the etching process.

Career Highlights

Kun Wang has worked with reputable companies in the technology sector, including Avago Technologies Wireless IP (Singapore) Pte. Ltd. and Avago Technologies General IP (Singapore) Pte. Ltd. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge innovations in RF technology.

Collaborations

Throughout his career, Kun has collaborated with notable professionals in the industry, including Richard C. Ruby and Paul D. Bradley. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Kun Wang's contributions to radio frequency technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in RF device design and fabrication. As he continues to advance in his field, his work will undoubtedly influence future developments in communication technology.

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