Kumarapuram Gopalakrishnan

Title: Innovations by Kumarapuram Gopalakrishnan

Introduction

Kumarapuram Gopalakrishnan is a notable inventor based in Malta, NY (US). He has made significant contributions to the field of semiconductor technology. His work focuses on methods that enhance the protection of dielectric mask layers in semiconductor devices.

Latest Patents

Gopalakrishnan holds a patent for "Methods of protecting a dielectric mask layer and related semiconductor devices." This patent describes devices and methods for forming semiconductor devices with a protection layer for a dielectric mask layer. One method involves obtaining a substrate that includes at least one dielectric layer or metal layer. It also includes forming a first SiCN dielectric mask layer on the top surface of the dielectric or metal layer, followed by forming a silicon nitride (SiNx) cap layer on the first SiCN dielectric mask layer. This innovation is crucial for improving the reliability and performance of semiconductor devices.

Career Highlights

Kumarapuram Gopalakrishnan is currently employed at GlobalFoundries Inc., a leading semiconductor manufacturer. His expertise in semiconductor technology has positioned him as a valuable asset to the company. He has been instrumental in developing advanced methods that enhance device performance and reliability.

Collaborations

Gopalakrishnan has collaborated with several talented individuals in his field, including Zhiguo Sun and Daniel P. Smith. These collaborations have fostered innovation and have contributed to the advancement of semiconductor technologies.

Conclusion

Kumarapuram Gopalakrishnan's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the development of reliable semiconductor devices.