Kumar Raja

Title: Innovations of Kumar Raja in Multi-Patterning Technology

Introduction

Kumar Raja is an accomplished inventor based in Concord, CA, known for his significant contributions to the field of multi-patterning technology. With a focus on improving the accuracy of overlay error measurements, his work has implications for the semiconductor industry.

Latest Patents

Kumar holds a patent titled "Determining multi-patterning step overlay error." This patent outlines methods and systems for determining overlay error between different patterned features of a design printed on a wafer during a multi-patterning step process. The invention utilizes a reference design from the first patterning step and synthetically shifts the designs for subsequent steps to achieve optimal global alignment. The final synthetic shifts provide a measurement of relative overlay error, enhancing the precision of multi-patterning technology.

Career Highlights

Kumar Raja is currently employed at Kla Tencor Corporation, where he applies his expertise in semiconductor manufacturing processes. His innovative approach to overlay error measurement has positioned him as a valuable asset in the industry.

Collaborations

Kumar collaborates with talented professionals such as Ajay Gupta and Thanh Huy Ha, contributing to a dynamic work environment that fosters innovation and technological advancement.

Conclusion

Kumar Raja's work in multi-patterning technology exemplifies the importance of precision in semiconductor manufacturing. His patent and contributions to Kla Tencor Corporation highlight his role as a leading inventor in this critical field.