Taichung, Taiwan

Kuei-Yu Deng

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kuei-Yu Deng. Retrieved from https://idiyas.com/inventor/kuei-yu-deng-e548prtg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Kuei-Yu Deng: Innovator in Semiconductor Technology

Introduction

Kuei-Yu Deng is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Kuei-Yu Deng holds a patent for a "Passivation structure for metal pattern." This invention pertains to a semiconductor device and the method of manufacturing it. The semiconductor device includes a substrate, a first via, a first pad, a second pad, and a first passivation layer. The first pad is positioned over the substrate, while the second pad is parallel to the first pad. The first passivation layer surrounds both pads, with specific thicknesses that exceed the heights of the respective pads.

Career Highlights

Kuei-Yu Deng is associated with Taiwan Semiconductor Manufacturing Company Ltd., a leading entity in the semiconductor industry. His work has contributed to advancements in semiconductor device manufacturing, showcasing his expertise and innovative spirit.

Collaborations

Kuei-Yu Deng has collaborated with notable colleagues, including Ching-Hung Kao and Tzy-Kuang Lee, who have also made significant contributions to the field.

Conclusion

Kuei-Yu Deng's innovative work in semiconductor technology, particularly his patent on passivation structures, highlights his role as a key inventor in the industry. His contributions continue to influence advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…