This inventor holds 5 USPTO granted patents and 2 published patent applications and 2 EPO patents. Top assignee: Fei Comapny. Active years: 2024-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2025
Title: Innovations by Krishna Kanth Neelisetty
Introduction
Krishna Kanth Neelisetty is a notable inventor based in Brno, Czech Republic. He has made significant contributions to the field of broad ion beam (BIB) systems, focusing on enhancing the efficiency of sample processing. With a total of 5 patents to his name, Neelisetty's work is paving the way for advancements in sample preparation workflows.
Latest Patents
Neelisetty's latest patents include innovative systems and methods for operating a broad ion beam (BIB) polisher. One of his patents describes a method for improving uptime in a sample preparation workflow. This involves using a first BIB source to emit a broad ion beam towards a sample while managing a second BIB source that can be removed when not in use. Another patent focuses on automated processing of multiple samples within a BIB system. This method streamlines the process by efficiently loading and polishing individual sample holders, ensuring that a desired portion of the sample is removed effectively.
Career Highlights
Krishna Kanth Neelisetty is currently employed at FEI Company, where he continues to develop and refine BIB technologies. His work has been instrumental in advancing the capabilities of sample processing systems, making them more efficient and reliable.
Collaborations
Neelisetty collaborates with talented professionals in his field, including Libor Novak and Michal Hrouzek. Their combined expertise contributes to the innovative projects at FEI Company.
Conclusion
Krishna Kanth Neelisetty's contributions to the field of broad ion beam systems exemplify the impact of innovation in sample processing. His patents reflect a commitment to improving efficiency and reliability in scientific workflows.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
