This inventor holds 2 USPTO granted patents. Top assignee: Sumco Techxiv Corporation. Active years: 2010-2011.
Company Filing History:
Years Active: 2010-2011
Title: Kouzo Nakamura: Innovator in Silicon Wafer Technology
Introduction
Kouzo Nakamura is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced silicon wafers. With a total of 2 patents to his name, Nakamura's work has had a substantial impact on the industry.
Latest Patents
Nakamura's latest patents include innovations in nitrogen-doped silicon wafers and methods for manufacturing them. One of his notable inventions is a method for obtaining an epitaxial wafer and a high-temperature heat treatment wafer that exhibit excellent gettering capabilities. This is achieved through a process of epitaxial growth or high-temperature heat treatment. His research has led to the derivation of a relational equation that relates the density of oxygen precipitates to the radius of these precipitates in silicon crystals doped with nitrogen during crystal growth. Furthermore, he has developed a method for controlling the proximity gettering structure in silicon semiconductor substrates, allowing for universal application across different manufacturers.
Career Highlights
Kouzo Nakamura is currently employed at Sumco Techxiv Corporation, where he continues to advance semiconductor technology. His work focuses on enhancing the quality and performance of silicon wafers, which are critical components in electronic devices. His innovative approaches have positioned him as a key figure in the semiconductor industry.
Collaborations
Nakamura has collaborated with notable colleagues, including Susumu Maeda and Takahisa Sugiman. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise in semiconductor research.
Conclusion
Kouzo Nakamura's contributions to silicon wafer technology exemplify the importance of innovation in the semiconductor industry. His patents and ongoing work continue to influence the development of advanced materials and manufacturing processes.