Location History:
- Nirasaki, JP (2015)
- Miyagi, JP (2017)
Company Filing History:
Years Active: 2015-2017
Title: Innovations in Etching Methods by Kousuke Koiwa
Introduction
Kousuke Koiwa, an innovative inventor hailing from Miyagi, Japan, has made significant contributions to the field of plasma processing technology. With a total of two patents to his name, his work focuses on enhancing etching methods that are crucial for advancing semiconductor manufacturing.
Latest Patents
Koiwa's recent patents include an advanced etching method and a plasma etching method. The etching method provides a technique for simultaneously etching first and second regions of a workpiece. The first region is composed of a multilayered film consisting of alternating silicon oxide and silicon nitride films, while the second region includes a silicon oxide film that is thicker than that in the first region. This process utilizes plasma generated from a first processing gas containing fluorocarbon gas, hydrofluorocarbon gas, and oxygen gas, followed by additional plasma generations from varied processing gases to achieve efficient etching.
The plasma etching method proposes a solution for etching an amorphous carbon layer on a substrate. By using Ogas as the processing gas, the method improves efficiency by maintaining a residence time of 0.37 msec or less within the processing chamber. This innovation enhances the precision of the etching process, allowing for more effective applications in the semiconductor industry.
Career Highlights
Kousuke Koiwa currently works at Tokyo Electron Limited, a leading company in semiconductor manufacturing equipment. His expertise and innovative approaches have contributed to the company's advancements in plasma processing technologies, ultimately benefiting the semiconductor manufacturing landscape.
Collaborations
Working alongside talented individuals such as Yu Nagatomo and Ryuuu Ishita, Koiwa has been instrumental in pushing the boundaries of what is possible in etching technologies. These collaborations provide a synergistic environment that fosters creativity and innovation within their projects.
Conclusion
Kousuke Koiwa's work exemplifies the cutting-edge advancements in the field of semiconductor technology through innovative etching methods. His contributions not only enrich Tokyo Electron Limited but also pave the way for future developments in the industry. His patents reflect a commitment to research and innovation, reinforcing the importance of continued progress in the realm of semiconductor manufacturing.