This inventor holds 1 USPTO granted patent. Top assignee: Semiconductor Process Laboratory Co., Ltd.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Kouji Tsukamoto: Innovator in Semiconductor Technology
Introduction
Kouji Tsukamoto is a notable inventor based in Mitaka, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of surface reforming methods.
Latest Patents
Kouji Tsukamoto holds 1 patent for a method titled "Method for reforming undercoating surface and method for production of." This invention focuses on a technique for reforming an undercoating surface prior to the formation of a prospective film using the CVD technique. The method utilizes a reaction gas that contains an ozone-containing gas and TEOS. It involves forming an undercoating insulating film on a substrate using a mixed gas with a concentration of ozone and a silicon-containing gas, followed by reforming the surface with a second silicon-containing gas.
Career Highlights
Kouji Tsukamoto has dedicated his career to advancing semiconductor processes. His innovative approaches have led to improvements in the efficiency and effectiveness of semiconductor manufacturing.
Collaborations
Kouji Tsukamoto has collaborated with Hiroshi Komiyama, contributing to the development of advanced semiconductor technologies.
Conclusion
Kouji Tsukamoto's work in semiconductor technology exemplifies the impact of innovative methods in enhancing manufacturing processes. His contributions continue to influence the field significantly.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile