Kouji Fujimura

Title: Kouji Fujimura: Innovator in Coating Technology

Introduction

Kouji Fujimura is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of coating technology, holding a total of 5 patents. His innovative approaches have led to advancements in methods and devices for coating substrates efficiently.

Latest Patents

Fujimura's latest patents include a coating method, coating device, and storage medium. This device is designed to form a coating film that can quickly coat a substrate of a follow-up lot after coating a preceding lot. The device integrates nozzles for both lots into a common movement mechanism, allowing them to be moved between the upper side of a liquid processing unit and a standby area. The coating method involves sucking air into the nozzle for the preceding lot to create an upper gas layer, sucking a solvent for the preceding lot in the standby area to form a thinner layer, and then sucking air into the nozzle to create a lower gas layer. This process results in a state where a solvent layer is interposed between the upper and lower gas layers.

Another notable patent is for a wet processing apparatus and method that can wet-process substrates while minimizing throughput reduction when certain components become unserviceable. This apparatus includes a first and second nozzle unit, which allows for the sequential processing of substrates in a normal mode. If any processing units become unserviceable, the nozzle unit for the serviceable group is moved to continue processing.

Career Highlights

Kouji Fujimura is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work has been instrumental in developing technologies that enhance the efficiency and effectiveness of coating processes.

Collaborations

Fujimura has collaborated with notable colleagues such as Yoshitaka Hara and Naofumi Kishita. Their combined expertise has contributed to the successful development of innovative technologies in the field.

Conclusion

Kouji Fujimura's contributions to coating technology through his patents and work at Tokyo Electron Limited highlight his role as a key innovator in the industry. His advancements continue to influence the efficiency of substrate processing methods.